Abstract:
Semiconductor coating is a principle technique which is used to fabricate semiconductors. Spin
coating is the commonly use technique to coat the semiconductors among the several coating
techniques such as spin coating, spray coating, physical vapor deposition (PVD) and chemical
vapor deposition (CVD). Spin coating is a process used to deposit uniform thin films to flat
substrates by applying a small amount of coating material on the centre of the substrate, which
is either spinning at low speed or not spinning at all and the substrate is rotated at high speed
in order to spread the coating material by centrifugal force. Although there are few researches
done with spin coating technique and its improvements, there are several defects such as limited
to flat surfaces, high material wastage and etc. Hence, to overcome from the limitations based
on spin coating, this thesis presents designing of a spray coating machine which is better than
the existing spin coating technique and to be used in multiple applications.
Citation:
Amal, W.G.G. (2021). Design and development of a uniform spray coater for spin coating [Master's theses, University of Moratuwa]. Institutional Repository University of Moratuwa. http://dl.lib.uom.lk/handle/123/20396